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Effect of self and cross-coupling capacitance on stability diagram in a metallic double-dot device

机译:自耦和交叉耦合电容对金属双点器件稳定性图的影响

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We investigate the effect of self and cross-coupling capacitance on stability diagram in a metallic double-dot device by theory and method. In linear transport regime, cross-coupling capacitances affect the dimension of the honeycomb cell and the distance of two triple points, while self capacitances only slightly broaden the boundary of the cell and make two triple point closer. In nonlinear transport regime, cross-coupling capacitances stretch the current region and charge region in the mid-line direction, while self capacitances extend the region of current regions but not change the shape of the stability cells. Cross-coupling capacitances make stronger impact on the dimensions of stability diagram than self capacitance. But the self-capacitance must be included in the current calculation if its value can not be neglected with respect to the device parameters.
机译:我们通过理论和方法研究了自耦合电容和交叉耦合电容对金属双点器件稳定性图的影响。在线性传输方式中,交叉耦合电容会影响蜂窝单元的尺寸和两个三点的距离,而自电容只会稍微加宽单元的边界并使两个三点更近。在非线性传输方式中,交叉耦合电容沿中线方向拉伸电流区域和电荷区域,而自电容扩展电流区域的区域,但不会改变稳定性电池的形状。交叉耦合电容对稳定性图尺寸的影响要大于自电容。但是,如果不能相对于设备参数忽略自电容的值,则必须将自电容包括在当前计算中。

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