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Experimental Studies of Al_(0.12)Ga_(0.88)N/GaN Heterostructure Varactors in View of Frequency Increases

机译:AL_(0.12)GA_(0.88)N / GAN异质结构变容变容仪的实验研究

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We report on a study regarding the performance of double-barrier heterostructure varactors based on Al_(0.12)Ga_(0.88)N/GaN when compared with Al_(0.70)Ga_(0.30)As/GaAs ones. The limitations are coming from the required decrease of the content of the aluminium in the barrier, which reduces the polarization charge effect and leads to a low barrier and a low figure of merit which limits the cut-off frequency of the device. As was previously shown, the polarization charge which form at the interfaces of the nitride materials with high values of x, create a non-symmetry in the D.C. and small signal characteristics, making corresponding Al_xGa_(1-x)N/GaN HBV unsuitable for high frequency applications. However, the higher electric field that can be sustained by the GaN material is a great advantage over GaAs and InGaAs because we can apply higher RF bias, thus allowing us to get more harmonic power. By stalking more than two barriers together, the overall performance of the device was expected to be improved, by means of output power and cut-off frequency.
机译:我们在与AL_(0.12)GA_(0.030)的基于AL_(0.12)GA_(0.88)N / GAN的基于AL_(0.12)GA / Ga / Ga_(0.30)作为/ GaAs。限制来自屏障中铝内容的所需减少,这降低了偏振电荷效应,并导致低屏障和低的优点,限制了装置的截止频率。如前所述,偏振电荷在具有高值X的氮化物材料的界面处形成的偏振电荷在DC和小信号特性中产生非对称性,使得相应的AL_XGA_(1-x)N / GaN HBV不适合高频应用。然而,可以由GaN材料维持的较高的电场是GaAs和IngaAs的一个很大的优势,因为我们可以应用更高的RF偏压,从而允许我们获得更多的谐波功率。通过将两个以上的障碍物一起踩踏,通过输出功率和截止频率来提高设备的整体性能。

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