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Saturation current improvement in 1200 V normally-off SiC VJFETs using non-uniform channel doping

机译:使用非均匀沟道掺杂改善1200 V常关SiC VJFET中的饱和电流

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Excellent performance and record inverter efficiency have been reported for 1200 V normally-off silicon carbide (SiC) vertical channel junction field effect transistors (VJFETs) with uniform channel doping. Optimally designed normally-off SiC VJFETs typically have a threshold voltage of approximately +1 V and pentode-like output characteristics with clear saturation. Some applications require significant surge or pulsed current capability thus it is desirable to increase saturation current density while maintaining normally-off operation. This paper reports the use of non-uniform channel doping in a normally-off SiC power VJFET to achieve a 28–48 % increase in saturation current and 13 % decrease in on-resistance compared to the uniform channel case. This results in a specific on-resistance of 2.5 mfl·cm2 and saturation current density of 1275 A·cm-2 at 25 °C. Forward drain leakage at Vgs= 0 V and Vds= 1100 V (measurement setup limit) is very similar for both channel doping profiles and remains less than 55 uA (1.75 mA·cm−2) at 150 °C for the non-uniform channel SiC VJFET. The total switching energy for non-uniform channel devices was 194 (µ compared to 190 (jJ for uniform channel devices.
机译:据报道,具有均匀沟道掺杂的1200 V常关碳化硅(SiC)垂直沟道结型场效应晶体管(VJFET)具有出色的性能和创纪录的逆变器效率。经过优化设计的常关SiC VJFET通常具有大约+1 V的阈值电压和具有明显饱和的五极型输出特性。一些应用需要很大的浪涌或脉冲电流能力,因此需要在保持常关工作的同时增加饱和电流密度。本文报道了在常关SiC功率VJFET中使用非均匀沟道掺杂可以使饱和电流增加28-48%,导通电阻降低13%的情况。这样在25°C时的导通电阻为2.5 mfl·cm 2 ,饱和电流密度为1275 A·cm- 2 。 V gs = 0 V和V ds = 1100 V(测量设置极限)时的正向漏极泄漏对于两个通道掺杂曲线都非常相似,并且保持低于55 uA(1.75)对于非均匀沟道SiC VJFET,在150°C时为mA·cm −2 )。非均匀通道设备的总开关能量为194(µ,而均匀通道设备的总开关能量为190(jJ)。

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