New layer system family for architectural galss based on dual twin-magnetron sputtered TiO_2

摘要

This paper reports on the latest results of a new layer family based on TIO_2, Si_3B_4 and SiO_2 suuttered with twin-magnetron cathdoes. These most prominent candidates for architectural and anti-reflective coatings can be deposited at high rates for more that 300 hours in stable continuous process. Bombardment of the growing fiolm by a high flux of energetic ions results in dense structures offering excellent optical properties with a high chemical resistance for protection against environmental attack.