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Effect of La dopant on electrical properties of Pb(Zr,Ti)O{sub}3 thin film capacitors

机译:La掺杂剂对Pb(Zr,Ti)O {Sub} 3薄膜电容器电性能的影响

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Lanthanum doped lead zirconate titanate (PZT) thin films have been prepared on Pt/IrO{sub}2/Ir/SiO{sub}2/Si substrates to improve the ferroelectric and retention properties. The microstructure and electrical properties of the PZT capacitors were evaluated as a function of La content. The crystalline orientation was appreciably influenced by the addition of La in PZT thin films. The microstructures of films containing 0 and 0.5 mol% La were single phase perovskite, but for La = 1 mol%, a second phase was detected by SEM observation. The 0.5 mol% La doped PZT thin film capacitor showed the best ferroelectric and retention properties for ferroelectric random access memory compared to non-doped PZT.
机译:已经在Pt / IRO {亚} 2 / IR / SIO {Sub} 2 / Si基板上制备镧掺杂铅锆钛酸钛酸盐(PZT)薄膜,以改善铁电和保留性能。 PZT电容器的微观结构和电性能被评价为LA含量的函数。通过在PZT薄膜中加入La的结晶取向显着影响。含有0和0.5mol%La的膜的微观结构是单相钙钛矿,但对于La = 1mol%,通过SEM观察检测第二相。 0.5mol%La掺杂的PZT薄膜电容器显示出与非掺杂PZT相比铁电随机存取记忆的最佳铁电和保留性能。

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