首页> 外文会议>Solid State Device Research Conference, 1991. ESSDERC '91 >Integrated Si/CoSi2/Si-Heterotransistors at High Current Densities
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Integrated Si/CoSi2/Si-Heterotransistors at High Current Densities

机译:高电流密度的集成Si / CoSi 2 / Si-异质晶体管

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We have fabricated integrated Si/CoSi2/Si-heterotransistors by MBE. The commonbase current gain of the devices is correlated to pinhole size and density. The electrical behaviour is investigated up to an emitter current density of 6000A/cm2. A decrease of current gain at high current densities is observed for devices with higher pinhole density. For devices with lower pinhole density, space charge effects will lead to an increase of emitter-to-collector delay time at high current densities.
机译:我们通过MBE制造了集成的Si / CoSi 2 / Si-异质晶体管。器件的公共基极电流增益与针孔尺寸和密度相关。在发射极电流密度高达6000A / cm 2 的情况下对电学行为进行了研究。对于具有较高针孔密度的器件,在高电流密度下会观察到电流增益的降低。对于具有较低针孔密度的器件,空间电荷效应将导致高电流密度下发射极到集电极的延迟时间增加。

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