首页> 外文会议>Solid State Device Research Conference, 1991. ESSDERC '91 >Applications of Scanning Tunneling Microscopy to the Characterization of Semiconductor Technologies and Devices
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Applications of Scanning Tunneling Microscopy to the Characterization of Semiconductor Technologies and Devices

机译:扫描隧道显微镜在半导体技术和器件表征中的应用

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In semiconductor surface research, the scanning tunneling microscope (STM) has been applied primarily to the study of the structural and electronic on figurations of elemental group IV surfaces on the atomic scale. Several investigations are reported on semiconductor compound substrates such as GaAs and adsorbates. The interest in epitaxially grown layers is growing, both on the growth plane and in cross sections. This survey will review essentials of elemental surfaces and then focus on growth-related STM work, notably epitaxy and cross sections of III-V compound multilayers. Examples of p-n junctions, interfacial regions and electronic structure across interfaces will be discussed, and a comparison with other spectroscopic and electron-microscopic techniques will be made.
机译:在半导体表面研究中,扫描隧道显微镜(STM)主要用于研究原子级IV族元素表面的结构化和电子化。报道了对诸如GaAs和吸附物之类的半导体化合物衬底的一些研究。无论是在生长平面上还是在横截面上,对外延生长层的兴趣都在增长。这项调查将审查元素表面的要点,然后重点关注与生长有关的STM工作,特别是III-V化合物多层的外延和横截面。将讨论p-n结,界面区域和跨界面的电子结构的示例,并将与其他光谱和电子显微镜技术进行比较。

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