首页> 外文会议>Pan Pacific Microelectronics Symposium >IMPACTS OF BULK PHOSPHOROUS CONTENT OF ELECTROLESS NICKEL LAYERS TO SOLDER JOINT INTEGRITY AND THEIR USE AS GOLD- AND ALUMINUM-WIRE BOND SURFACES
【24h】

IMPACTS OF BULK PHOSPHOROUS CONTENT OF ELECTROLESS NICKEL LAYERS TO SOLDER JOINT INTEGRITY AND THEIR USE AS GOLD- AND ALUMINUM-WIRE BOND SURFACES

机译:化学镍层大块含磷量对焊接接头完整性的影响及其用作金和铝导线表面

获取原文

摘要

The influence of co-deposited phosphorus within an electroless nickel layer (from low- to high-P) on the reliability of the solder joint integrity and aluminum-wire bond performance was investigated. The solder joint evaluation was conducted using solder mask-defined and non-solder mask-defined BGAs as test vehicles and using the ball shear technique to establish the level of any "brittle fracture". The type and structure of the intermetallic compound (IMC) created before and after thermal cycling was examined relative to the co-deposited phosphorus (from mid- to high-P) within an electroless nickel layer to determine if there is any influence on solder joint integrity. It was found that as the nickel thickness decreased and the gold thickness increased the highest impact on solder joint integrity was observed. However in the case of higher P content, even at the lower nickel thickness no signs of any brittle fracture were found Two types of IMC were created on the thermo-cycled product using lead-free (Sn-Ag-Cu) solder balls, which were of different structural and chemical composition. The needle-like IMC structure is (Ni,Cu)_3Sn_4 with Ag_3Sn co-dispersed into the bulk solder, while the chunky IMC structure is (Cu,Ni)fSns. The phosphorus enrichment after the immersion gold reaction and soldering showed a 30% lower enrichment at the interface of the electroless Nickel / C-Ni-Sn IMC using a high-phosphorus ENIG system. The mid-range phosphorus electroless nickel layer showed a wide spread of all force/length curves as compared to high-phosphorus layers, which were not negatively influenced by 1000 thermal cycles. For aluminum-wire bonding, no effect is observed by varying the bulk phosphorus content, neither for "as received" nor after 4 hours at 150°C annealing. Gold-wire bonding showed very good results with high-P electroless Nickel with only one-tenth of the gold thickness of that used for electrolytic nickel/gold. Based on this investigation, the recommendation would be to use high-P ENIG system for superior joint reliability.
机译:研究了化学镀镍层(从低磷到高磷)中共沉积磷对焊点完整性可靠性和铝线键合性能的影响。焊点评估是通过使用阻焊层定义的和未阻焊层定义的BGA作为测试工具进行的,并使用球剪技术确定任何“脆性断裂”的水平。相对于化学镀镍层中共沉积的磷(从中P到高P),检查了热循环前后产生的金属间化合物(IMC)的类型和结构,以确定对焊点是否有影响正直。发现随着镍厚度的减少和金厚度的增加,对焊点完整性的影响最大。但是,在较高的P含量的情况下,即使在较低的镍厚度下也没有发现任何脆性断裂的迹象,使用无铅(Sn-Ag-Cu)焊球在热循环产品上生成了两种IMC。具有不同的结构和化学组成。针状IMC结构为(Ni,Cu)_3Sn_4,Ag_3Sn共分散在块状焊料中,而块状IMC结构为(Cu,Ni)fSns。浸金反应和焊接后的磷富集显示,使用高磷ENIG系统的化学镍/ C-Ni-Sn IMC界面处的磷富集度降低了30%。与高磷层相比,中程磷化学镀镍层显示了所有力/长度曲线的广泛分布,而不受1000次热循环的不利影响。对于铝线键合,无论是“原样”还是在150°C退火4小时后,通过改变总磷含量都没有发现效果。高引线化学镀镍的金线键合显示出非常好的结果,其金厚度仅为电解镍/金所用金厚度的十分之一。基于此调查,建议使用高P ENIG系统,以提高接头的可靠性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号