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Analysis of piezoresistance in n-type 6H SiC for high-temperature mechanical sensors

机译:高温机械传感器用n型6H SiC的压阻分析

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Piezoresistance in n-type 6H SiC was analyzed on the basis of electron transfer and mobility shift mechanisms for hexagonal many-valley semiconductors. Three important gauge factors for piezoresistive sensor application, i.e., the longitudinal-, transverse-and shear gauge-factors, were calculated by using band parameters. The calculation was compared with experimental results taken from the literature. It was shown that incorporation of the electron transfer and the mobility shift mechanisms gives reasonable interpretation for piezoresistance in n-type 6H SiC within temperature range from 300 K to 523 K, and impurity concentration at n=3.3/spl times/10/sup 19/ cm/sup -3./ These conditions correspond to typical operation ranges of high-temperature piezoresistive sensors.
机译:基于电子转移和六边形多谷半导体的电动移位机制,分析了N型6H SiC中的压阻。通过使用带参数计算压阻传感器应用的三个重要规范因子,即纵向,横向和剪切计量因子。将计算与从文献中取出的实验结果进行了比较。结果表明,掺入电子转移和迁移率换档机制在300k至523k的温度范围内为N型6H SiC的压阻提供合理的解释,以及n = 3.3 / spl时间/ 10 / sp的杂质浓度/ cm / sup -3./这些条件对应于高温压阻传感器的典型操作范围。

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