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Modeling nonparabolicity effects in silicon inversion layers

机译:模拟硅反型层中的非抛物线效应

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We present a method to include the nonparabolicity correction for the bulk dispersion relation in the self-consistent solution of Schrodinger and Poisson equation. A formalism has been derived which allows us to characterize each subband by its energy, an effective mass and a subband nonparabolicity coefficient. A one-dimensional Schrodinger-Poisson solver has been developed which is applicable to both MOS and heterostructures. The program is applied to silicon inversion layers, and the influence of nonparabolicity on the subband system is quantitatively analyzed. As a consequence of nonparabolicity the wave functions depend on the in-plane momentum of the carriers.
机译:我们提出一种方法,以在Schrodinger和Poisson方程的自洽解中包括对体积弥散关系的非抛物线校正。已经形成了形式主义,这使我们能够通过其能量,有效质量和子带非抛物线系数来表征每个子带。已开发出一维Schrodinger-Poisson求解器,该求解器适用于MOS和异质结构。该程序应用于硅反型层,并定量分析了非抛物线性对子带系统的影响。由于非抛物线性,波函数取决于载波的面内动量。

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