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PERFORMANCE EVALUATION OF TANTALUM NITRIDE THIN FILM HARD COATED K20 CARBIDE INSERT ON MACHINING INCONEL 600

机译：在INCONEL 600上加工氮化钽薄膜硬涂层K20硬质合金刀片的性能评估

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《》|2006年||共6页
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1. Performance evaluation of CBN, coated carbide, cryogenically treated uncoated/coated carbide inserts in finish-turning of hardened steel [J] . Manu Dogra, Vishal S. Sharma, Anish Sachdeva, The International Journal of Advanced Manufacturing Technology . 2011,第5a8期

机译：CBN，涂层硬质合金，经深冷处理的未涂层/涂层硬质合金刀片在淬硬钢中的性能评估
2. Performance evaluation of CBN, coated carbide, cryogenically treated uncoated/coated carbide inserts in finish-turning of hardened steel [J] . Manu Dogra, Vishal S. Sharma, Anish Sachdeva, The International Journal of Advanced Manufacturing Technology . 2011,第5a8期

机译：CBN，涂层硬质合金，经深冷处理的未涂层/涂层硬质合金刀片在淬硬钢精加工中的性能评估
3. Tool wear and machining performance of cBN-TiN coated carbide inserts and PCBN compact inserts in turning AISI4340 hardened steel [J] . Abhijeet S. More, Wenping Jiang, W. D. Brown, Journal of Materials Processing Technology . 2006,第1a3期

机译：cBN-TiN涂层硬质合金刀片和PCBN紧凑型刀片在车削AISI4340淬硬钢中的刀具磨损和加工性能
4. PERFORMANCE EVALUATION OF TANTALUM NITRIDE THIN FILM HARD COATED K20 CARBIDE INSERT ON MACHINING INCONEL 600 [C] . S. Parthasarathy, G. Srikrishna, J. Rohit Fernando, International Technology and Innovation Conference . 2006

机译：钽氮化物薄膜硬涂层K20碳化物嵌入式inconel inconel 600的性能评价
5. Tool life and flank wear modeling of physical vapour deposited titanium aluminum nitride/titanium nitride multilayer coated carbide inserts when end milling 4340 steel under dry and semi-dry cutting conditions [D] . Chakraborty, Pinaki 2007

机译：在干式和半干式切削条件下端铣4340钢时，物理气相沉积的氮化钛铝/氮化钛多层涂层硬质合金刀片的刀具寿命和侧面磨损模型
6. Thin film transfer for the fabrication of tantalum nitride photoelectrodes with controllable layered structures for water splitting [O] . Chizhong Wang, Takashi Hisatomi, Tsutomu Minegishi, 2016

机译：薄膜转移用于制造具有可控分层结构的氮化钽光电极用于水分解
7. Multi performance optimization in machining of EN31-535A99SS with interchangeable straight cemented tungsten carbide-cobalt mixed (WC–Co) insert grade (CSTC—K20) using Taguchi coupled grey relational analysis [O] . Zahid Hussain 2020

机译：使用Taguchi耦合灰色关系分析，用互换直芯碳化钨碳化钨 - 钴混合（WC-CO）插入等级（CSTC-K20）加工的多功能优化
8. Growth of Low Defect Density Gallium Nitride (GaN) Films on Novel Tantalum Carbide (TaC) Substrates for Improved Device Performance [R] . Derenge, M. A., Jones, K. A., Kirchner, K. W., 2009

机译：新型碳化钽（TaC）衬底上低缺陷密度氮化镓（GaN）薄膜的生长，提高器件性能

PERFORMANCE EVALUATION OF TANTALUM NITRIDE THIN FILM HARD COATED K20 CARBIDE INSERT ON MACHINING INCONEL 600

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