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Low Temperature Microcrystalline Silicon Solar Cells Prepared by Hot-Wire Chemical Vapor Deposition

机译：热线化学气相沉积制备的低温微晶硅太阳能电池

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Intrinsic hydrogenated microcrystalline silicon (muc-Si:H) films were prepared by hot-wire chemical vapor deposition (HWCVD) using a graphite filament at a substrate temperature of 210degC. Films were characterized by Raman Spectroscopy, FTIR and electrical conductivity measurements with varying silane concentrations on glass substrates. Solar cells were fabricated in a glass/SnO₂/pin/Al structure and device efficiency was measured to be 2.8%

机译：通过使用石墨丝在210摄氏度的衬底温度下进行热线化学气相沉积（HWCVD）来制备本征氢化微晶硅（muc-Si：H）膜。通过拉曼光谱，FTIR和电导率测量对薄膜进行表征，并在玻璃基板上使用不同的硅烷浓度。太阳能电池以玻璃/ SnO _{2 / pin / Al结构制造，测得器件效率为2.8％}

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《》|2006年|1632-1634|共3页
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Adachi; M.M.; Tse; W.F.L.; Karim; K.S.;
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Fourier transform spectra; Raman spectra; chemical vapour deposition; electrical conductivity; elemental semiconductors; hydrogen; infrared spectra; semiconductor growth; semiconductor thin films; silicon; solar cells; 2.8 percent; 210 C; FTIR; HWCVD; Raman spectroscopy;

机译：傅里叶变换光谱;拉曼光谱;化学气相沉积;电导率;元素半导体;氢;红外光谱;半导体生长;半导体薄膜;硅;太阳能电池; 2.8％; 210 C; FTIR; HWCVD;拉曼光谱;

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1. Deposition of microcrystalline silicon prepared by hot-wire chemical-vapor deposition: The influence of the deposition parameters on the material properties and solar cell performance [J] . Stefan Klein, Friedhelm Finger, Reinhard Carius, Journal of Applied Physics . 2005,第2期

机译：通过热线化学气相沉积制备的微晶硅的沉积：沉积参数对材料性能和太阳能电池性能的影响
2. Hot-wire chemical vapor deposition prepared aluminum doped p-type microcrystalline silicon carbide window layers for thin film silicon solar cells [J] . Tao Chen, Florian Koehler, Anna Heidt, Japanese journal of applied physics . 2014,第5S1期

机译：热线化学气相沉积制备的用于薄膜硅太阳能电池的铝掺杂p型微晶碳化硅窗口层
3. Gas phase nucleation of crystalline silicon and their role in low-temperature deposition of microcrystalline films during hot-wire chemical vapor deposition [J] . Sung-Soo Lee, Min-Sung Ko, Chan-Soo Kim, Journal of Crystal Growth . 2008,第15期

机译：结晶硅的气相成核及其在热线化学气相沉积过程中在微晶膜低温沉积中的作用
4. Low Temperature Microcrystalline Silicon Solar Cells Prepared by Hot-Wire Chemical Vapor Deposition [C] . Adachi M.M., Tse W.F.L., Karim K.S. World Conference on Photovoltaic Energy Conversion . 2006

机译：通过热线化学气相沉积制备的低温微晶硅太阳能电池
5. Low temperature thin film silicon solar cells prepared by hot-wire chemical vapor deposition [D] . Adachi, Michael M. 2007

机译：通过热线化学气相沉积制备的低温薄膜硅太阳能电池
6. Transferless Inverted Graphene/Silicon Heterostructures Prepared by Plasma-Enhanced Chemical Vapor Deposition of Amorphous Silicon on CVD Graphene [O] . Martin Müller, Milan Bouša, Zdeňka Hájková, 2020

机译：CVD石墨烯上等离子增强化学气相沉积法制备的无转移反型石墨烯/硅异质结构
7. Deposition of microcrystalline silicon prepared by hot-wire chemical-vapor deposition : the influence of the deposition parameters on the material properties and solar cell performance [O] . Klein, Stefan, Finger, Friedhelm, Carius, Reinhard, 2005

机译：热线化学气相沉积制备的微晶硅的沉积：沉积参数对材料性能和太阳能电池性能的影响
8. Study of Microcrystalline, Silicon-Carbon p-Layers Prepared by Photo-CVD (Chemical/Vapor Deposition) and Glow Discharge: Final Subcontract Report, December 1, 1987-November 30, 1988. [R] . Schade, H. 1989

机译：通过光CVD（化学/气相沉积）和辉光放电制备的微晶硅 - 碳p层的研究：最终转包报告，1987年12月1日 - 1988年11月30日。

Low Temperature Microcrystalline Silicon Solar Cells Prepared by Hot-Wire Chemical Vapor Deposition

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