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Strained-layer InGaAs-GaAs-AlGaAs buried heterostructure lasers by three-step selective-area metalorganic chemical vapor deposition

机译:三步选择区金属有机化学气相沉积法制备应变层InGaAs-GaAs-AlGaAs埋层异质结构激光器

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In this talk, we present the fabrication process and laser results for narrow stripe, index-guided strained layer lasers with low threshold currents and good spectral characteristics. Threshold currents as low as 11 mA for uncoated devices and single longitudinal mode operation are obtained for the three step growth buried heterostructure laser, indicating high quality device performance for devices fabricated with an AlGaAs regrowth step.
机译:在本次演讲中,我们介绍了具有低阈值电流和良好光谱特性的窄条纹,折射率导引应变层激光器的制造工艺和激光结果。对于三步生长掩埋异质结构激光器,未涂覆器件和单纵向模式操作的阈值电流低至11 mA,这表明用AlGaAs再生步骤制造的器件具有高质量的器件性能。

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