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Subthreshold current in thick and thin-film SOI MOSFET transistors

机译:厚膜SOI MOSFET晶体管中的亚阈值电流

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Summary form only given. The subthreshold conduction regime in thick- and thin-film inversion-type SOI MOSFETs is studied in detail. Using the depletion approximation, a 1-dimensional analytical expression for the subthreshold slope is derived. The model accounts for the influence of the front and back interface properties (D/sub it/) on the subthreshold swing in the thin-film regime. The coupling between front and back surface potential, and the role of backside conduction on the front interface characteristics, are accounted for. The analysis covers the case where the front-channel conduction dominates and there is full depletion of the SOI film; the classical formula still holds. However, when the SOI film is fully depleted from the front side but accumulation holds at the back side (depending on the back-gate bias), the back-channel conduction dominates.
机译:仅提供摘要表格。详细研究了厚膜和薄膜反型SOI MOSFET的亚阈值导通状态。使用损耗近似,得出亚阈值斜率的一维解析表达式。该模型考虑了前后界面特性(D / subit /)对薄膜状态下阈值摆幅的影响。考虑到正面和背面电位之间的耦合以及背面传导对正面界面特性的作用。分析涵盖了前沟道传导占主导地位且SOI膜完全耗尽的情况。经典公式仍然成立。但是,当SOI膜从正面完全耗尽而在背面保持堆积(取决于背栅偏压)时,背沟道传导占主导地位。

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