首页> 外文会议>In-Line Characterization, Yield Reliability, and Failure Analyses in Microelectronic Manufacturing >Advanced holography for microelectronic manufacturing: novel methods well fitted for real time in the line checks performed in the industrial environment
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Advanced holography for microelectronic manufacturing: novel methods well fitted for real time in the line checks performed in the industrial environment

机译:用于微电子制造的高级全息术:非常适合在工业环境中进行的生产线检查中实时适用的新颖方法

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摘要

Abstract: Current manufacturing processes require rapid, inexpensive and reliable techniques for optical inspections of machinery, products and components. Holography and holographic interferometry in spite of their attractive features are rather rarely used for industrial inspections due to relative complexity, costs, lengthy multi-stage procedures, need of dark roms and vibration insulation. Personnel skilled in optics ins also required. Thus holography is usually regarded as poorly compatible with practical industrial environment. !30
机译:摘要:当前的制造过程需要快速,廉价和可靠的技术来对机械,产品和组件进行光学检查。尽管全息照相术和全息照相干涉术具有吸引人的特征,但由于其相对复杂,成本高,冗长的多阶段程序,需要深色光敏材料和隔振,因此很少用于工业检查。还需要光学ins技术人员。因此,全息照相通常被认为与实际工业环境不兼容。 !30

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