Semiconductor Manufacturing International Corporation,18 Zhang Jiang Rd.,Pudong New Area,Shanghai 201203,China;
Semiconductor Manufacturing International Corporation,18 Zhang Jiang Rd.,Pudong New Area,Shanghai 201203,China;
Semiconductor Manufacturing International Corporation,18 Zhang Jiang Rd.,Pudong New Area,Shanghai 201203,China;
Semiconductor Manufacturing International Corporation,18 Zhang Jiang Rd.,Pudong New Area,Shanghai 201203,China;
Semiconductor Manufacturing International Corporation,18 Zhang Jiang Rd.,Pudong New Area,Shanghai 201203,China;
Semiconductor Manufacturing International Corporation,18 Zhang Jiang Rd.,Pudong New Area,Shanghai 201203,China;
机译:HALO和源极/漏极注入对45nm PMOS器件阈值电压的影响
机译:与B_2H_6 PLAD优化的锗共植入物,可提供更好的先进PMOS器件性能
机译:通过低水平算法优化心脏可植入设备来降低心电图信号快速傅里叶变换的功率和周期要求
机译:光晕植入优化65nm低功率PMOS器件逆窄宽度效果改进
机译:具有超低静态电流的宽带宽高电源抑制比PMOS线性低压丢失调节器
机译:通过针对心脏植入设备的低级算术优化来降低ECG信号FFT的功耗和周期要求
机译:14位10KS / S功率高效65nm SAR ADC用于心脏可植入医疗设备