首页> 外文会议>IPC Printed Circuits Expo, Apex, and the Designers Summit vol.2; 20060205-10; Anaheim,CA(US) >Electrodeposited Nanocrystalline Copper for Printed Wiring Board Applications
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Electrodeposited Nanocrystalline Copper for Printed Wiring Board Applications

机译:用于印刷线路板应用的电沉积纳米晶铜

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Nanocrystalline and ultra-fine grain copper can potentially offer increased reliability and functionality of printed wiring boards due to expected enhancements in strength and achievable wiring density by grain size reduction. In this research in-house synthesized nanocrystalline and ultra-fine grain-size copper foils produced by pulsed electrodeposition were compared with commercially available electronic grade polycrystalline electrodeposited (EG-ED) and cold rolled annealed (EG-CRA) copper foil. The microstructures of all materials were characterized by transmission electron microscopy (TEM). Nano-indentation and the four-point probe technique were used to evaluate their hardness and electrical resistivity, respectively. It is shown that grain size reduction results in significant increases in hardness at a moderate loss in conductivity.
机译:纳米晶和超细晶粒铜可能通过减小晶粒尺寸而提高强度和可达到的布线密度,从而有望提高印刷线路板的可靠性和功能性。在这项研究中,将通过脉冲电沉积生产的内部合成的纳米晶和超细晶粒铜箔与市售的电子级多晶电沉积(EG-ED)和冷轧退火(EG-CRA)铜箔进行了比较。所有材料的微观结构均通过透射电子显微镜(TEM)表征。纳米压痕和四点探针技术分别用于评估其硬度和电阻率。结果表明,晶粒的减小导致硬度的显着提高,而导电性却有所下降。

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