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Laser Techniques for High-Volume Microvia Formation

机译:大批量微孔形成的激光技术

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摘要

With demand for portable electronics and wired telecommunications devices soaring and product cycles measured in months instead of years, it is estimated that the global market for microvias will expand by a factor of 20 in less than seven years. Such enormous growth creates an urgent need for cost-effective, high-volume microvia formation methods for advanced PWB and HDI fabrication. This paper briefly outlines the market forces driving microvia technology today and compares the four principal microvia formation techniques: mechanical, photovia, plasma, and laser drilling. A more thorough discussion follows on the two most successful laser technologies for microvia formation, CO_2 and UV diode-pumped solid-state, with an emphasis on what PWB manufacturers should be looking for in each. Included in this discussion are details on process speed, via diameter, types of dielectrics, via quality, and process parameter considerations.
机译:随着对便携式电子产品和有线电信设备的需求猛增以及以几个月而不是几年来衡量产品周期,据估计,全球微孔市场将在不到七年的时间内增长20倍。如此巨大的增长迫切需要用于先进的PWB和HDI制造的具有成本效益的大批量微孔形成方法。本文简要概述了推动微孔技术发展的市场力量,并比较了四种主要的微孔形成技术:机械,光孔,等离子和激光钻孔。接下来是关于微孔形成的两种最成功的激光技术(CO_2和UV二极管泵浦的固态)的更详尽讨论,重点是PWB制造商在每种技术中应寻找的东西。该讨论中包括有关处理速度,通孔直径,电介质类型,通孔质量和处理参数注意事项的详细信息。

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