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Laser microvia formation in polyimide thin films for metallization applications

机译:用于金属化应用的聚酰亚胺薄膜中的激光微孔形成

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Purpose - The purpose of this paper is to demonstrate laser microvia drilling of polyimide thin films from multiple sources before metallic sputtering. This process flow reduces Flexible Printed Circuit Board (FPCB) material, chemical and operational costs by 90 per cent in the construction of flexible circuits. Design/methodology/approach - The UV laser percussion drilling of microvias in 25 /urn thick polyimide films with low coefficients of thermal expansion (CTE) and elastic modulii was investigated. Results were obtained using Scanning Electron Microscopy and Surface Profilometry. Polyimide films tested included: Dupont? Kapton? EN; Kolon? GP and LV; Apical? NPI; and Taimide? TA-T. Findings - There was no direct relationship between the top and bottom diameters and ablation depth rates between the polyimide films tested using the same test conditions. There was a direct relationship with exit diameters and etch rates at different laser pulse frequency rates and fluence levels. Laser pulse rates at 30 kHz produced 20 per cent larger exit diameters than at 70 kHz, however at 70 kHz the first pulse etched 16.5 per cent more material. High fluence levels etched more material but with a lower etch efficiency rate. Other microvia quality concerns such as surface swelling, membrane residues on the bottom side and surface debris inside the microvias were observed. Nanoscale powder-like surface debris was observed on all samples in all test conditions. Originality/value - This is the first comparison of material specifications and costs for films from multiple polyimide manufactures and laser microvia drilling. The paper also is the first to demonstrate results using a JDSU ? Lightwave Q302? laser rail. The results provide the first insights into potential microvia membrane issues and debris characteristics.
机译:目的-本文的目的是演示在金属溅射之前对来自多个源的聚酰亚胺薄膜进行的激光微孔钻孔。这种工艺流程在构造柔性电路时将柔性印刷电路板(FPCB)的材料,化学和运营成本降低了90%。设计/方法/方法-研究了25微米厚的热膨胀系数(CTE)和弹性模量低的聚酰亚胺薄膜中的微孔的UV激光冲击钻。使用扫描电子显微镜和表面轮廓测定法获得结果。测试的聚酰亚胺薄膜包括:杜邦?卡普顿? EN;可隆? GP和LV;心尖? NPI;和泰米德? TA-T。发现-在相同测试条件下测试的聚酰亚胺薄膜的顶部和底部直径与烧蚀深度速率之间没有直接关系。在不同的激光脉冲频率速率和注量水平下,出口直径和蚀刻速率直接相关。 30 kHz时的激光脉冲速率比70 kHz时的出口直径大20%,但是在70 kHz时,第一个脉冲蚀刻的材料多16.5%。高通量水平可蚀刻更多材料,但蚀刻效率较低。还观察到其他微通孔质量问题,例如表面膨胀,底侧的膜残留以及微通孔内部的表面碎屑。在所有测试条件下,在所有样品上均观察到纳米级粉末状表面碎片。原创性/价值-这是来自多个聚酰亚胺制造商的薄膜和激光微孔钻孔的材料规格和成本的首次比较。该论文还是第一个使用JDSU演示结果的文件。光波Q302?激光导轨。结果为潜在的微孔膜问题和碎片特征提供了首次见解。

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