首页> 外文会议>IOP Conference Series no.174; International Symposium on Compound Semiconductors; 20021007-10; Lausanne(CH) >Injection energy dependence of electron thermalization length in AlGaAs/GaAs quantum well structures
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Injection energy dependence of electron thermalization length in AlGaAs/GaAs quantum well structures

机译:AlGaAs / GaAs量子阱结构中电子热化长度的注入能量依赖性

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摘要

We have investigated the transport properties of hot electrons in AlGaAs/GaAs quantum well structures in real space by using a scanning tunneling microscope (STM). The electrons were injected from the STM tip at different distances from a target well. Then by measuring the light emission intensity from the target well, the thermalization and diffusion lengths of the injected electrons were determined. We found that the thermalization length increases with the increase of the initial energy of injection, while the diffusion length is independent of the injection energy.
机译:我们已经通过使用扫描隧道显微镜(STM)研究了AlGaAs / GaAs量子阱结构中热电子在真实空间中的传输特性。电子从STM尖端以距目标阱不同的距离注入。然后,通过测量目标阱的发光强度,确定注入电子的热化和扩散长度。我们发现热化长度随注入初始能量的增加而增加,而扩散长度与注入能量无关。

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