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Traps in neutron-transmutation-doped silicon introduced by proton irradiation

机译:质子辐照引入的中子掺杂硅陷阱

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Abstract: In this work, n-type neutron transmutation doped silicon irradiated by high energy, low dose protons have been investigated. Proton irradiation introduces deep energy levels in the bandgap of silicon, which act as recombination centers. Parameters of deep energy levels have been measured by the deep level transient spectroscopy (DLTS) method. Five electron traps and two hole traps have been observed. Deep energy levels are characterized by energy position in the bandgap, capture coefficients for majority carriers, and concentration profiles of trap densities. The possible identity of each trap is discussed with respect to data published in the literature. !17
机译:摘要:本文研究了高能,低剂量质子辐照的n型中子trans杂硅。质子辐照在硅的带隙中引入了深能级,这些能级充当了复合中心。深能级参数已通过深能级瞬态光谱法(DLTS)进行了测量。已经观察到五个电子陷阱和两个空穴陷阱。深能级的特征在于带隙中的能量位置,多数载流子的捕获系数以及陷阱密度的浓度曲线。关于每个陷阱的可能身份,参考文献中公布的数据进行讨论。 !17

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