首页> 外文会议>International Symposium on Ultra Clean Processing of Silicon Surfaces(UCPSS); 20060918-20; Antwerp(BE) >Acoustic Field Analysis of a T Type Waveguide in Single Wafer Megasonic Cleaning and Its Effect on Particle Removal
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Acoustic Field Analysis of a T Type Waveguide in Single Wafer Megasonic Cleaning and Its Effect on Particle Removal

机译:单晶片兆声波清洗中T型波导的声场分析及其对颗粒去除的影响

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摘要

T type megasonic waveguide was analyzed by finite element method (FEM), acoustic pressure measurements and particle removal efficiency for the single wafer cleaning application. Compared to conventional longitudinal waves, a transverse waves were generated in a T type waveguide. Not like longitudinal waves, transverse waves showed changes of direction and phase which increased the cleaning efficiency.
机译:对于单晶片清洁应用,通过有限元方法(FEM),声压测量和颗粒去除效率来分析T型超音速波导。与传统的纵波相比,在T型波导中产生了横波。与纵波不同,横波显示方向和相位的变化,从而提高了清洁效率。

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