首页> 外文会议>International Symposium on Thin Film Transistor Technologies; 20021021-20021023; Salt Lake City,UT; US >LOW TEMPERATURE POLYCRYSTALLINE SILICON THIN FILM TRANSISTORS FABRICATED BY ELECTROLESS PLATING NI INDUCED CRYSTALLIZATION OF AMORPHOUS SI
【24h】

LOW TEMPERATURE POLYCRYSTALLINE SILICON THIN FILM TRANSISTORS FABRICATED BY ELECTROLESS PLATING NI INDUCED CRYSTALLIZATION OF AMORPHOUS SI

机译:化学镀Ni诱导非晶态Si的结晶制备低温多晶硅薄膜晶体管。

获取原文
获取原文并翻译 | 示例

摘要

Compared with conventional solid phase crystallized (SPC) thin-film transistors (TFTs), metal-induced laterally crystallized (MILC) TFTs exhibit significantly enhanced performance. Metal films were usually deposited by the physical vapor deposition (PVD) method. In this work, a simpler electroless plating Ni was introduced to replace PVD Ni. It was found that the morphologies and the device characteristics of Ni induced lateral crystallization TFT were as good as those of PVD Ni induced lateral crystallization TFT.
机译:与传统的固相结晶(SPC)薄膜晶体管(TFT)相比,金属诱导的横向结晶(MILC)TFT显示出显着增强的性能。金属膜通常通过物理气相沉积(PVD)方法沉积。在这项工作中,引入了一种更简单的化学镀镍来代替PVD Ni。发现Ni诱导的横向结晶TFT的形态和器件特性与PVD Ni诱导的横向结晶TFT的形态和器件特性一样好。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号