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A Review of Sensing Technologies for Semiconductor Process Applications

机译:半导体工艺应用传感技术综述

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As semiconductor manufacturing technology advances, there exists a need to review improvements in process monitoring and control. Some of these improvements may be possible by investigating and integrating advanced process sensors. Sensors typically provide information to equipment controllers for proper machine operation. Expanding this definition, a sensor could deliver quality information about the semiconductor product being manufactured. Sensors can provide effective manufacturing line operation, reduced cycle times, and improved product quality. Implementing advanced sensors can also reduce process variability, increase process stability, and provide many other benefits applicable to modern semiconductor production operation.rnIn this paper, a review of the current literature on semiconductor process sensor technology is presented. Much of the literature discusses in-situ measurements for film thickness, particles, and / or other conditions which could affect the quality of the product. Instruments such as RGAs (Residual Gas Analyzers), in-situ particle, and in-situ film thickness monitors represent current and future advanced sensors.rnPrior to implementing sensors, it would be ideal to reduce the number of process measurements as much as possible to insure sensor effectiveness. It will be ideal to have a working cost of ownership model in place to baseline operations and monitor improvements as sensors move into the production line. There are many new sensors available with highly improved performance, accuracy, and even built-in electronics. These sensors can replace or supplement existing equipment sensors to improve performance, reliability, and extend equipment life. With the increasing costs of maintaining capital equipment, successful implementation could mean substantial savings. These and many other implementation issues are also presented.rnThe paper concludes by discussing future opportunities for new sensor technologies and emerging support technologies such as MEMS (Microelectromechanical Systems).
机译:随着半导体制造技术的进步,有必要审查过程监视和控制方面的改进。通过研究和集成高级过程传感器可以实现其中的某些改进。传感器通常向设备控制器提供信息,以使机器正常运行。扩大这个定义,传感器可以提供有关正在制造的半导体产品的质量信息。传感器可以提供有效的生产线操作,缩短周期时间,并提高产品质量。实施先进的传感器还可以减少工艺变异性,提高工艺稳定性,并提供适用于现代半导体生产操作的许多其他好处。本文对半导体工艺传感器技术的现有文献进行了综述。许多文献讨论了膜厚度,颗粒和/或可能影响产品质量的其他条件的原位测量。 RGA(残留气体分析仪),原位微粒和原位膜厚监测仪等仪器代表了当前和未来的先进传感器。在实现传感器之前,理想的是尽可能减少过程测量的次数确保传感器的有效性。理想的是建立一个拥有成本模型来进行基线操作,并在传感器进入生产线时监控改进情况。有许多新传感器可用,它们的性能,准确性以及甚至内置的电子器件都大大提高了。这些传感器可以替代或补充现有的设备传感器,以提高性能,可靠性并延长设备寿命。随着维护基本设备的成本增加,成功实施可能意味着节省大量资金。本文还讨论了这些以及许多其他实现问题。本文最后通过讨论新型传感器技术和新兴支持技术(如MEMS)的未来机会来结束。

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