Characterization and Wettability of TiO_2 Films Deposited by Mid-Frequency Magnetron Reactive Sputtering

摘要

TiO_2 films were deposited by using mid-frequency twin magnetron reactive sputtering technique at ambient temperature on quartz and Si wafer. The films were annealed after deposition. The phase composition and surface morphology of the TiO_2 films were characterized by X-ray diffraction, Raman spectroscopy, and scanning electron microscopy, while the optical properties and contact angle were measured using a UV-Vis spectrophotometer and a contact angle meter. It is indicated that anatase phase dominates below 900℃ and a mixture of rutile and anatase exists in the film annealed at 1000℃. Furthermore, the hydrophilic property depends on phase composition and morphological change in TiO_2 films.