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Defect influence on the electrical properties of 4H-SIC Schottky diodes

机译:缺陷对4H-SIC肖特基二极管的电性能的影响

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摘要

We report on the defect influence on the electrical properties of 4H-SiC Schottky diodes. The devices were fabricated on a n-type epilayer treated by chemical mechanical polishing. A surface defect map allows to correlate the defect presence to the electrical behavior of the devices. We find that the devices realized on a free defect zone and on micropipes do not show important differences in electrical parameters.
机译:我们报告了缺陷对4H-SiC肖特基二极管电学性能的影响。器件在通过化学机械抛光处理的n型外延层上制造。表面缺陷图允许将缺陷的存在与设备的电性能相关联。我们发现,在自由缺陷区和微管上实现的设备在电气参数上没有显示出重要差异。

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