首页> 外文会议>International Conference on Silicon Carbide and Related Materials 2003 pt.1(ICSCRM 2003); 20031005-20031010; Lyon; FR >Excess Carrier Lifetime Mapping for Bulk SiC Wafers by Microwave Photoconductivity Decay Method and Its Relationship with Structural Defect Distribution
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Excess Carrier Lifetime Mapping for Bulk SiC Wafers by Microwave Photoconductivity Decay Method and Its Relationship with Structural Defect Distribution

机译:微波光电导衰减法测定块状SiC晶片的载流子寿命映射及其与结构缺陷的关系。

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Excess carrier lifetime in commercially available bulk 2 in. 4H- and 6H-SiC wafers were characterized by the microwave photoconductivity decay (μ-PCD) method. We obtained maps of the lifetime in the entire wafer. In each wafer, we observed several small regions in which the lifetime is relatively longer than the rest of the wafer. We also observed the birefringence and X-ray Lang topograph for the wafers in order to see structural defect distribution and measured net donor concentrations within the wafers. From comparison of the lifetime maps with structural defect observation, the long lifetime regions was found to correspond to regions with high density of structural defects.
机译:通过微波光电导衰减(μ-PCD)方法表征了市售的2 in。4H-和6H-SiC块状体中多余的载流子寿命。我们获得了整个晶片寿命的图。在每个晶片中,我们观察到几个小区域,在这些区域中,其寿命比其余晶片要长。我们还观察了晶片的双折射和X射线Lang形貌图,以便查看结构缺陷分布并测量晶片内的净施主浓度。通过将寿命图与观察到的结构缺陷进行比较,发现长寿命区域对应于结构缺陷密度高的区域。

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