【24h】

First-Principles Calculations of Metal/Oxide Interfaces: Effects of Interface Stoichiometry

机译:金属/氧化物界面的第一性原理计算:界面化学计量的影响

获取原文
获取原文并翻译 | 示例

摘要

Ab initio pseudopotential calculations of Cu/Al_2O_3 and Au/TiO_2 interfaces have revealed strong effects of interface Stoichiometry. About the Cu/Al_2O_3 system used for coatings and electronic devices, the interfacial bond of the O-terminated (O-rich) Cu/Al_2O_3(0001) interface is very strong with ionic and covalent Cu-O interactions, although that of the Al-terminated (stoichiometric) one is rather weak with electrostatic and Cu-Al hybridization interactions. About the Au/TiO_2 system with unique catalytic activity, the adhesive energy between non-stoichiometric (Ti-rich or O-rich) TiO_2(110) surface and a Au layer is very large, and there occur substantial charge transfer and orbital hybridization, which should have close relations to the catalytic activity.
机译:Cu / Al_2O_3和Au / TiO_2界面的从头算伪势计算显示出界面化学计量的强大影响。关于用于涂料和电子设备的Cu / Al_2O_3系统,O端(富O)的Cu / Al_2O_3(0001)界面的界面键与离子和共价Cu-O相互作用非常牢固,尽管Al端接的(化学计量的)分子与静电和Cu-Al杂化相互作用相当弱。对于具有独特催化活性的Au / TiO_2系统,非化学计量(富钛或富O)的TiO_2(110)表面与Au层之间的粘合能非常大,并且发生大量的电荷转移和轨道杂交,它应该与催化活性密切相关。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号