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First-Principles Calculations of Metal/Oxide Interfaces: Effects of Interface Stoichiometry

机译:金属/氧化物界面的第一原理计算:界面化学计量的影响

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Ab initio pseudopotential calculations of Cu/Al_2O_3 and Au/TiO_2 interfaces have revealed strong effects of interface Stoichiometry. About the Cu/Al_2O_3 system used for coatings and electronic devices, the interfacial bond of the O-terminated (O-rich) Cu/Al_2O_3(0001) interface is very strong with ionic and covalent Cu-O interactions, although that of the Al-terminated (stoichiometric) one is rather weak with electrostatic and Cu-Al hybridization interactions. About the Au/TiO_2 system with unique catalytic activity, the adhesive energy between non-stoichiometric (Ti-rich or O-rich) TiO_2(110) surface and a Au layer is very large, and there occur substantial charge transfer and orbital hybridization, which should have close relations to the catalytic activity.
机译:Cu / Al_2O_3和Au / TiO_2界面的AB Initio伪能量计算揭示了界面化学计量的强烈影响。关于用于涂层和电子器件的Cu / Al_2O_3系统,O封端(富o)Cu / Al_2O_3(0001)界面的界面键非常强,离子和共价Cu-O相互作用非常强,尽管Al - 用静电和Cu-Al杂交相互作用相当弱(化学计量)。关于具有独特催化活性的Au / TiO_2系统,非化学计量(富含Ti或富含O-富含的)TiO_2(110)表面和Au层之间的粘合能量非常大,并且发生了大量电荷转移和轨道杂交,这应该与催化活性密切相关。

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