【24h】

ANNEALING EFFECTS ON THE STRUCTURE AND LUMINOUS PROPERTIES OF THIN FILM PHOSPHORS

机译:退火对薄膜荧光粉结构和发光性能的影响

获取原文
获取原文并翻译 | 示例

摘要

ZnGa_20_4:Mn and CaTi0_3: Pr thin film phosphors were prepared by rf magnetron reactive sputtering method. And then the relation between the structure and luminous properties by annealing was characterized. To observe the effects of the annealing conditions, thin films were heat-treated in vacuum, N_2 and air circumstance. By heat treatment, PL intensity increased, because it eliminated the defects in films and improved the crystallinity. Also, the atomic composition and the structural evolution depended on the annealing conditions.
机译:采用射频磁控反应溅射法制备了ZnGa_20_4:Mn和CaTiO_3:Pr薄膜荧光粉。然后通过退火表征了结构与发光性能之间的关系。为了观察退火条件的影响,在真空,N_2和空气环境下对薄膜进行了热处理。通过热处理,PL强度增加,因为它消除了膜中的缺陷并改善了结晶度。而且,原子组成和结构演变取决于退火条件。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号