首页> 外文会议>International Conference on Defects in Semiconductors; 20070722-27; Albuquerque,NM(US) >Dose rate dependence of radiation-induced lattice defects and performance degradation in npn Si bipolar transistors by 2-MeV electron irradiation
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Dose rate dependence of radiation-induced lattice defects and performance degradation in npn Si bipolar transistors by 2-MeV electron irradiation

机译:2-MeV电子辐照在npn Si双极晶体管中辐射诱导的晶格缺陷的剂量率依赖性和性能下降

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摘要

Total-dose response of npn Si transistors by 2-MeV electrons is presented for different dose rates. The base current increases after irradiation, whereas the collector current decreases. Therefore, the current gain (β) decreases by irradiation. The degradation of electrical properties by 2-MeV electrons for low dose rate is higher than that for high dose rate. Similar dose rate dependence of the radiation-induced electron trap densities is observed by deep-level transient spectroscopy (DLTS) measurements.
机译:提出了不同剂量率下2-MeV电子对npn Si晶体管的总剂量响应。照射后,基极电流增加,而集电极电流减小。因此,电流增益(β)由于照射而降低。低剂量率时2-MeV电子对电性能的降低高于高剂量率时。通过深层瞬态光谱(DLTS)测量,可以观察到辐射诱导的电子陷阱密度具有相似的剂量率依赖性。

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