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Role of doped layers in phase relaxation of carriers inquantum well

机译:掺杂层在载流子量子阱的相弛豫中的作用

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The temperature and gate voltage dependences of the phase breaking time arestudied experimentally in GaAs/InGaAs heterostructures with a single quantum well. It isshown that appearance of states at the Fermi energy in the doped layers leads to a significantdecrease of the phase breaking time of the carriers in the quantum well and to saturation of thephase breaking time at low temperature.
机译:在具有单个量子阱的GaAs / InGaAs异质结构中,通过实验研究了相断开时间的温度和栅极电压依赖性。结果表明,在掺杂层中费米能量处的状态的出现导致量子阱中载流子的相分离时间大大减少,并且在低温下导致相分离时间达到饱和。

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