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Leakage Current Degradation in SiC Junction Barrier Schottky Diodes under Heavy Ion Microbeam

机译:重离子微束作用下SiC结势垒肖特基二极管的漏电流衰减

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Leakage current degradation of SiC junction barrier Schottky diodes were studied under heavy ion microbeam. Leakage current increased linearly with fluence and was positively related to bias voltage. It was proposed that leakage current occurred as a result of the accumulation of multiple leakage paths. The explanation that the increased leakage current was related to leakage paths formed by damage in the mechanism of 'micro-SEB' was verified.
机译:研究了重离子微束作用下SiC结势垒肖特基二极管的漏电流衰减情况。漏电流与注量呈线性关系,并且与偏置电压成正相关。提出由于多个泄漏路径的累积而发生泄漏电流。证实了增加的泄漏电流与“微型SEB”机制中的损坏所形成的泄漏路径有关的解释。

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