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Surface potential variations in epitaxial graphene devices investigated by Electrostatic Force Spectroscopy

机译:静电力谱研究外延石墨烯器件中的表面电势变化

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Electrostatic Force Spectroscopy and Scanning Kelvin Probe Microscopy techniques are used to study the performance of side-gated Hall devices made of epitaxial graphene on 4H-SiC(0001). Electrostatic Force Spectroscopy is a novel method which allows quantitative surface potential measurements with high spatial resolution. Using these techniques, we calibrate work function of the metal coated tip and define the work functions for single and double-layer graphene. We also show that the use of moderate strength electrical fields in the side-gate geometry does not notably change the performance of the device.
机译:静电力谱和扫描开尔文探针显微镜技术用于研究由外延石墨烯制成的侧面门控霍尔器件在4H-SiC(0001)上的性能。静电力谱法是一种新颖的方法,它允许以高空间分辨率对表面电位进行定量测量。使用这些技术,我们可以校准金属涂层尖端的功函,并定义单层和双层石墨烯的功函。我们还表明,在侧门几何结构中使用中等强度的电场不会明显改变器件的性能。

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