首页> 外文会议>IEEE 26th International SOC Conference >A disturb-free subthreshold 9T SRAM cell with improved performance and variation tolerance
【24h】

A disturb-free subthreshold 9T SRAM cell with improved performance and variation tolerance

机译:具有改善的性能和变化容限的无干扰亚阈值9T SRAM单元

获取原文
获取原文并翻译 | 示例

摘要

This paper presents a novel subthreshold 9T SRAM cell with row-based Word-Line (WL) and column-based data-aware Write Word-Lines (WWLs). The decoupled Read port and cross-point Write structure provide a disturb-free cell and facilitate bit-interleaving architecture to improve soft error immunity. Compared with a previous cross-point Write 9T subthreshold SRAM cell reported in the literature, the proposed 9T SRAM cell offers comparable stability with improved Read performance and variation-tolerance. Monte Carlo simulations based on UMC 40nm Low-Power (40LP) technology indicate that the BL access time improves by 15.35% to 17.37%, and the variation (τ of BL access time) improves by 5.12% to 9.22% for VDD ranging from 0.3V to 0.6V. Based on a 72Kb SRAM macro design in UMC 40LP process, the proposed 9T cell achieves about 9% better chip access time (Ta) at SS corner for VDD ranging from 0.3V to 0.45V.
机译:本文提出了一种新型的亚阈值9T SRAM单元,该单元具有基于行的字线(WL)和基于列的数据感知的写字线(WWL)。解耦的读取端口和交叉点写入结构提供了一个无干扰的单元,并促进了位交织架构,从而提高了抗软错误性。与文献中报道的以前的交叉点Write 9T亚阈值SRAM单元相比,建议的9T SRAM单元具有相当的稳定性,并具有改进的读取性能和变化容差。基于UMC 40nm低功耗(40LP)技术的蒙特卡洛仿真表明,对于VDD范围为0.3的情况,BL的访问时间缩短了15.35%至17.37%,而BL的访问时间的变化量(BL的访问时间τ)改善了5.12%至9.22%。 V至0.6V。基于UMC 40LP工艺中的72Kb SRAM宏设计,对于VDD范围为0.3V至0.45V的情况,拟议的9T单元在SS拐角处的芯片访问时间(Ta)大约提高了9%。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号