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Preparation and Film-Substrate Stress Analysis Of CVD Diamond Film Coating Tools

机译:CVD金刚石膜涂层工具的制备及膜-基体应力分析

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The diamond thin films was deposited by hot filament CVD method in the Cemented Carbide (YG6) substrate.The surface morphology and quality of the diamond film coating was detected by scanning electron microscopy and Raman spectrometer.The internal stress of the diamond thin films and Cemented Carbide substrate,exerted by load,was calculated by the method of finite element numerical analysis.The analysis result shows that the internal stress of the film is tensile stress.The maximum appear in the blade and the tip place,the stress distribution more evenly in the middle area of the film.The stress is a zonal distribution and reduced gradually from the matrix surface to bottom in the Cemented Carbide,the resuhs of the finite element analysis can provide the reference for the other methods to determin the diamond film stress and improve the stress between the membrane and substrate.
机译:采用热丝CVD法将金刚石薄膜沉积在硬质合金(YG6)基体上,通过扫描电子显微镜和拉曼光谱仪检测金刚石薄膜涂层的表面形貌和质量,金刚石薄膜和硬质合金的内应力通过有限元数值分析方法计算出了载荷作用下的硬质合金基体。分析结果表明,薄膜的内应力为拉应力。最大值出现在叶片和叶尖处,应力分布更均匀。应力为带状分布,在硬质合金中从基体表面到底部逐渐减小,有限元分析的结果可为确定金刚石膜应力和改善金刚石膜应力的其他方法提供参考。膜和基材之间的应力。

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