首页> 外文期刊>Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology >Preparation of CVD diamond coatings on gamma titanium aluminide using MPECVD with various interlayers
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Preparation of CVD diamond coatings on gamma titanium aluminide using MPECVD with various interlayers

机译:使用具有各种中间层的MPECVD在γ-铝化钛上制备CVD金刚石涂层

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摘要

CVD diamond coatings were deposited on to gamma-TiAl surfaces using a microwave plasma enhanced CVD to improve wear properties and the performance of gamma-TiAl Diamond coatings were directly deposited on to gamma-TiAl substrates and deposited on to TiC, Ti5Si3, Al2O3 + TiO2, and Si interlayers prepared on gamma-TiAl substrates. The diamond coatings deposited directly on gamma-TiAl suffered severe delamination and cracked. Those deposited on TiC and Ti5Si3 interlayers partially delaminated, whereas those deposited on Al2O3 + TiO2 and Si interlayers adhered well to the underlying Surfaces. The diamond films obtained were characterized using scanning electron microscopy, Raman spectroscopy, and X-ray diffraction. Raman spectra showed that polycrystalline and nanocrystalline diamond films grew on gamma-TiAl. Residual internal stresses of the diamond coatings deposited on interlayered-gamma-TiAl were estimated experimentally from Raman spectra. The coatings prepared on Al2O3 + TiO2/gamma-TiAl and Si/gamma-TiAl showed lower residual stresses. (c) 2008 Elsevier Ltd. All rights reserved.
机译:使用微波等离子体增强CVD将CVD金刚石涂层沉积在γ-TiAl表面上以改善磨损性能,并将γ-TiAl金刚石的性能直接沉积在γ-TiAl基底上并沉积在TiC,Ti5Si3,Al2O3 + TiO2上和在γ-TiAl衬底上制备的Si中间层。直接沉积在γ-TiAl上的金刚石涂层严重脱层并破裂。沉积在TiC和Ti5Si3中间层上的那些部分分层,而沉积在Al2O3 + TiO2和Si中间层上的那些则很好地粘附到下面的表面。使用扫描电子显微镜,拉曼光谱和X射线衍射对获得的金刚石膜进行表征。拉曼光谱表明,多晶和纳米晶金刚石薄膜在γ-TiAl上生长。从拉曼光谱实验估计了沉积在层间γ-TiAl上的金刚石涂层的残余内应力。在Al2O3 + TiO2 /γ-TiAl和Si /γ-TiAl上制备的涂层显示出较低的残余应力。 (c)2008 Elsevier Ltd.保留所有权利。

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