Study of dielectric strength of polycrystalline CVD diamond films for thermalmanagement in power electronic

摘要

In this paper we present ourrninvestigation on dielectric strength for diamond filmsrnwith thickness ranging from 100 μm to 200 μm.rnIndustrials CVD diamond films, type 2a naturalrndiamond and home made CVD diamond set samplesrnare compared. Dielectric strength from 30 kV/mm torn120 kV/mm are measured on CVD diamond using thernbreakdown voltage measurement in AC and DC.rnThese values are lower than the ones expected forrnnatural diamond but they are still higher than otherrnsubstrate materials like Al2O3, AlN or SiC.rnThe dependence of dielectric strength on the phasernpurity and nitrogen contents has been investigated.rnThese parameters have been estimated by Ramanrnspectroscopy.rnThermal conductivity, thermo-mechanicalrnproperties are also discussed to prove the goodrnaptitude of polycrystalline CVD diamond for highrnvoltage high power electronic heat sinks applications.