Combining nanoimprint lithography, electroplating and microstructuring techniques to fabricate 3D nanostructured multielectrode arrays for biological

摘要

To improve cell recording in multielectrode array (MEA) technology a tight cell-electrode contact is essential. This can be achieved by three dimensional micro- or nanostructures on top of the sensing electrodes, which can trigger an engulfment process of the cell. We developed a process based on nanoimprint lithography, electroplating and microstructuring techniques, which enables the fabrication of 3D nanostructured MEAs with different nanostructure shapes, geometries and pitch lengths to adapt the optimized nanostructure properties to different cell types. Cyclic voltammetry as well as electrochemical impedance spectroscopy showed an increase of the electrochemical surface area. Recordings of the noise potentials of the MEAs showed a decrease in noise for the nanostructured electrodes.