Department of Electrical Engineering, University of South Carolina, Columbia, South Carolina 29208, USA;
Department of Electrical Engineering, University of South Carolina, Columbia, South Carolina 29208, USA;
Department of Electrical Engineering, University of South Carolina, Columbia, South Carolina 29208, USA;
Department of Electrical Engineering, University of South Carolina, Columbia, South Carolina 29208, USA;
Department of Electrical Engineering, University of South Carolina, Columbia, South Carolina 29208, USA;
机译:四氟硅烷和二氯硅烷在立式热壁CVD炉中SiC外延生长的研究
机译:C / Si比和氮掺杂对使用二氯硅烷前体的4H-SiC外延生长的影响
机译:在热壁CVD反应器中使用二氯硅烷进行高生长速率的4H-SiC外延生长
机译:二氯硅烷和四氟硅烷前体SiC外延生长的比较
机译:超音速分子束在Si(100)上外延生长β-SiC。
机译:各种缺陷对4H-SiC肖特基二极管性能的影响及其与外延生长条件的关系
机译:使用二氯硅烷的高生长速率4H-siC外延生长 热壁CVD反应器