首页> 外文会议>Future of Electron Devices, Kansai (IMFEDK), 2012 IEEE International Meeting for >Electrical property of DNA field-effect transistor; Charge retention property
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Electrical property of DNA field-effect transistor; Charge retention property

机译:DNA场效应晶体管的电性能;电荷保持特性

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We discovered the charge retention property of the field-effect transistor (FET) in a Si gate/SiO2/DNA channel structure. The DNA FET with the Si source and drain showed hole conduction, and the drain current was controlled by the gate voltage application. By inserting the refresh process of gate voltage application of −50V between each measurement, the current increase was restrained. This phenomenon indicates that the trap and detrap process of electrons occurs in the DNA channel depending on the gate voltage application. The charge retention mechanism was also discussed.
机译:我们发现了Si栅极/ SiO2 / DNA通道结构中场效应晶体管(FET)的电荷保持特性。具有Si源极和漏极的DNA FET显示出空穴传导,并且通过施加栅极电压来控制漏极电流。通过在每次测量之间插入-50V的栅极电压施加刷新过程,可以抑制电流的增加。这种现象表明,取决于栅极电压的施加,电子的捕获和释放过程会在DNA通道中发生。还讨论了电荷保持机制。

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