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Rapid and accurate determination of transparency conductivity etchability patternability and manufacturability of ITO films

机译:快速准确地确定ITO薄膜的透明导电性可蚀刻性和可制造性

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Abstract: We present a method for the rapid characterization of indium tin oxide (ITO) films. The method determines, from a simple optical measurement, the values of the refractive index (n) and extinction coefficient (k) from 190 to 1100 nm, film thickness, and energy band gap. Also we show that the spectra of the extinction coefficient can be correlated to the film's resistivity. This capability allows the determination of values for the resistivity of ITO films from a very fast and simple optical measurement.!11
机译:摘要:我们提出了一种快速表征铟锡氧化物(ITO)膜的方法。该方法通过简单的光学测量来确定从190到1100 nm的折射率(n)和消光系数(k)的值,膜厚度和能带隙。我们还表明消光系数的光谱可以与薄膜的电阻率相关。此功能可通过非常快速和简单的光学测量来确定ITO膜的电阻率值!11

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