首页> 外文会议>Ferroelectric Thin Films XI >CHARACTERIZATION OF EPITAXIAL Pb(Zr_x,Ti_(1-x))O_3 THIN FILMS WITH COMPOSITION NEAR THE MORPHOTROPIC PHASE BOUNDARY
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CHARACTERIZATION OF EPITAXIAL Pb(Zr_x,Ti_(1-x))O_3 THIN FILMS WITH COMPOSITION NEAR THE MORPHOTROPIC PHASE BOUNDARY

机译:近晶相界附近的表观Pb(Zr_x,Ti_(1-x))O_3薄膜的表征

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200-nm-thick Pb(Zr_x,Ti_(1-x))O_3 (PZT) thin films with zirconium composition in the range from 0% to 65% were epitaxially grown on (001)_c SrRuO_3 (SRO)//SrTiO_3 (STO) single crystal substrates by pulsed metalorganic chemical vapor deposition (pulsed MOCVD). Constituent crystallographic phases were characterized by high-resolution X-ray diffraction reciprocal space mapping. It was found that PZT thin films having zirconium composition from 45% to 60% show mixed tetragonal and pseudocubic phases and their lattice parameters remained constant in this composition range.
机译:在(001)_c SrRuO_3(SRO)// SrTiO_3(上)上外延生长200纳米厚的Pb(Zr_x,Ti_(1-x))O_3(PZT)锆组成的薄膜。 STO)单晶衬底,通过脉冲金属有机化学气相沉积(pulsed MOCVD)。组成结晶相的特征在于高分辨率X射线衍射互易空间映射。发现锆组成为45%至60%的PZT薄膜显示出混合的四方相和假立方相,并且它们的晶格参数在该组成范围内保持恒定。

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