首页> 外文会议>European Conference on Silicon Carbide and Related Materials(ECSCRM 2004); 20040831-0904; Bologna(IT) >Modeling of Lattice Site-Dependent Incomplete lonization in α-SiC Devices
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Modeling of Lattice Site-Dependent Incomplete lonization in α-SiC Devices

机译:α-SiC器件中取决于晶格的不完全电离的建模

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In contrast to narrow bandgap semiconductors such as silicon, common doping elements in SiC have activation energies larger than the thermal energy k_BT even at room temperature. Inequivalent α-SiC sites, one with cubic (k) surrounding and the other with hexagonal (h) surrounding are expected to cause site-dependent impurity levels. Therefore, an appropriate incomplete ionization model which accounts for lattice site-dependent ionization level of impurities in α-SiC has been developed and implemented in the general-purpose device simulator MINIMOS-NT.
机译:与诸如硅之类的窄带隙半导体相反,SiC中常见的掺杂元素即使在室温下,其活化能也大于热能k_BT。预期不相等的α-SiC部位,其中一个以立方(k)包围,而另一个以六边形(h)包围,会引起取决于部位的杂质水平。因此,已经开发出并在通用设备模拟器MINIMOS-NT中实现了一个适当的不完全电离模型,该模型考虑了α-SiC中杂质的晶格位置相关离子化水平。

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