Ar Annealing at 1600℃ and 1650℃ of Al~+ Implanted p~+ 4H-SiC Diodes: Analysis of the J-V Characteristics Versus Annealing Temperature

摘要

We report on the electrical characterization of Al~+ implanted p~+ 4H-SiC diodes via a planar technology. Hot implantation at 400℃ and post implantation annealing at 1600℃ and 1650℃ in high purity Argon ambient were done for the realization of p~+ diodes. The current voltage characteristics of the p~+ diodes and the resistivity of the implanted layer were measured at room temperature. The majority of the 136 measured diodes had a turn on voltage of 1.75 V for both annealing temperatures. The 1600℃ annealed diodes showed an almost exponential forward characteristic with ideality factor equal to 1.4, an average reverse leakage current density equal to (4.8 ± 0.1)x10~(-9) A/cm~2 at -100 V, and a break down voltage between 600 and 900V. The 1650℃ annealed diodes often had forward "excess current component" that deviates from the ideal forward exponential trend. The average reverse leakage current density was equal to (2.7 ± 0.5)x10~(-8) A/cm~2 at -100V, and the breakdown voltage was between 700 and 1000V, i.e. it approached the theoretical value for the epitaxial 4H-SiC layer.