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Annealing effects of diluted GaAs nitride and bismide on photoluminescence

机译:稀释的GaAs氮化物和铋的退火对光致发光的影响

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摘要

Effects of the post-growth thermal anneal on the optical properties of GaNAsBi were systematically investigated. By the addition of Bi into diluted GaAs nitride alloy to form quaternary GaNAsBi alloy, the optical property of the diluted GaAs nitride alloy is improved which is confirmed by the photoluminescence (PL) emission from as-grown GaNAsBi samples at room temperature. The PL intensity of GaNAsBi is remarkably improved by post-growth thermal annealing process. By comparing the results of PL intensities of GaAs_(0.978)Bi_(0.022), GaN_(0.01)As_(0.99), and GaN_(0.01)As_(0.968) Bi_(0.022), the improvement in PL intensity of GaN_(0.01)As_(0.968)Bi_(0.022) by anneal can be attributed to an inherited nature of GaNAs. Incorporation of Bi may suppress the blue shift induced by N incorporation. Based on results of X-ray diffraction, the blue shift is probably caused by a microscale reorganization of N and Bi mainly inside the epilayers with keeping the average N and Bi concentrations constant.
机译:系统研究了生长后热退火对GaNAsBi光学性能的影响。通过将Bi添加到稀释的GaAs氮化物合金中形成四元GaNAsBi合金,可以改善稀释的GaAs氮化物合金的光学性能,这可以通过室温下生长的GaNAsBi样品的光致发光(PL)发射得到证实。 GaNAsBi的PL强度通过生长后热退火工艺显着提高。通过比较GaAs_(0.978)Bi_(0.022),GaN_(0.01)As_(0.99)和GaN_(0.01)As_(0.968)Bi_(0.022)的PL强度结果,可以改善GaN_(0.01)的PL强度退火后的As_(0.968)Bi_(0.022)可以归因于GaNA的继承特性。 Bi的掺入可以抑制由N掺入引起的蓝移。根据X射线衍射的结果,蓝移可能是由于N和Bi的微观重组,主要是在表层内部,同时保持平均N和Bi浓度恒定。

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