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Reaction Pathway Analysis of Homogeneous Dislocation Nucleation in a Perfect Molybdenum Crystal

机译:完美钼晶体中均匀位错成核的反应途径分析

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Reaction pathway analysis was carried out for homogeneous dislocation nucleation in perfect crystal Mo. The reaction sampling method employed was based on the Nudged Elastic Band algorithm and other extended schemes. Results obtained were compared with corresponding results for Cu and Si. The stress range for activation energies less than 5 eV is found to be considerably higher for Mo than those for Cu as well as Si. Stresses in excess of 12 GPa make homogeneous dislocation nucleation in Mo an unrealistic transition. The results also show the dislocation cores under this stress range to be diffused, with shear displacement of particles being considerably less than the Burgers vector. Depending on the applied stress, displacement of extra slip-plane atoms can be considerable in Mo. This is in contrast to Cu, in which dislocation nucleation is essentially a two-plane phenomenon.
机译:对完美晶体Mo中的均匀位错成核进行了反应路径分析。所采用的反应采样方法基于Nudged弹性带算法和其他扩展方案。将获得的结果与相应的Cu和Si结果进行比较。发现活化能小于5 eV的应力范围对于Mo来说要比对Cu和Si的要高得多。超过12 GPa的应力使Mo中均匀的位错形核成为不现实的过渡。结果还表明,在该应力范围内,位错核得以扩散,颗粒的剪切位移明显小于Burgers向量。根据所施加的应力,额外的滑移面原子在Mo中的位移可能会很大。这与Cu相反,在Cu中,位错成核本质上是一种两平面现象。

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