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Impurity segregation in Al doped GaSb studied by cathodoluminescence microscopy

机译:阴极发光显微镜研究掺铝砷化镓中的杂质偏析

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Cathodoluminescence (CL) in the scanning electron microscope (SEM) has been used to investigate the effect of doping with an isoelectronic dopant, aluminum, on the native acceptors and on the general structure of extended defects of gallium antimonide single crystals. While there is no significant change in th native defect content, decoration of non-radiative recombination centers or extended defects occurs as a result of aluminum doping.
机译:扫描电子显微镜(SEM)中的阴极发光(CL)已被用于研究掺杂等电子掺杂剂铝对天然受体和锑化镓单晶扩展缺陷的一般结构的影响。尽管天然缺陷含量没有显着变化,但铝掺杂的结果是发生了非辐射复合中心的装饰或扩展缺陷。

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