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Complementary Feed-Forward and Feedback Method for Improved Critical Dimension Control

机译:改进的临界尺寸控制的互补前馈和反馈方法

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In modern day semiconductor manufacturing, control of patterned line widths is an especially important task as even the smallest deviation from desired critical dimension (CD) target could result in undesirable electrical results. Traditional methods of CD control have included a feedback component where dose is adjusted through time, based on the measured critical dimensions of previous lots. Depending on process setup, stack influence on patterned features can often be diminished by introduction of organic anti-reflection coating (ARC) prior to the application of photoresist. Unfortunately even with an ARC layer, due to extreme topography and film stack, CD influences may be pronounced. Most often any such CD influence is exhibited as a Lot-2-Lot (L2L) component of variation and to a lesser degree as a Wafer-2-Wafer (W2W) component. A simple feedback system can be adjusted to encompass a larger number of lots for dose recommendations thus making certain to include closer to the entire population of stack variation. An improved control system is one in which this feedback component is supplemented by a feed-forward component where a certain stack predictor is used in providing a specific recommendation for a lot. Stack information for a lithographic layer used in DRAM manufacturing will be presented alongside with a relationship existing between critical dimensions of features patterned in photoresist and top film thickness. Significant economic rework cost reduction and improvement in CD control with a two-month implementation of a complementary feedforward and feedback system will be compared against performance with the feedback only system.
机译:在当今的半导体制造中,图案化线宽的控制是一项特别重要的任务,因为即使与所需临界尺寸(CD)目标的最小偏差也可能导致不良的电气结果。 CD控制的传统方法包括一个反馈组件,该组件根据先前批次的已测量临界尺寸,通过时间调整剂量。根据工艺设置的不同,通常可通过在施加光致抗蚀剂之前引入有机减反射涂层(ARC)来减少叠层对图案化特征的影响。不幸的是,即使具有ARC层,由于极端的形貌和薄膜堆叠,CD的影响可能仍然很明显。最常见的是,任何此类CD影响都表现为Lot-2-Lot(L2L)变异成分,较小程度地表现为Wafer-2-Wafer(W2W)成分。可以调整一个简单的反馈系统,以包含更多批次的剂量建议,从而确保更接近整个堆叠变化。一种改进的控制系统是这样的,其中该反馈组件由前馈组件补充,在该组件中使用某个堆栈预测变量来提供大量建议。将介绍在DRAM制造中使用的光刻层的堆栈信息,以及光刻胶中图案化的特征的关键尺寸和顶膜厚度之间存在的关系。将通过两个月实施互补前馈和反馈系统来显着降低经济返工成本并改善CD控制,将其与仅反馈系统的性能进行比较。

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