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Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control

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1.Mix-and-match overlay method by compensating dynamic scan distortion error

机译：通过补偿动态扫描失真误差来混合和匹配覆盖方法
- 作者：Takuya Kono;Manabu Takakuwa;Keita Asanuma;Nobuhiro Komine;Tatsuhiko Higashiki
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control》 | 2004年
- mix and match;
- dynamic scan distortion;
- APC system;
2.Propagation of APC models across product boundaries

机译：APC模型在产品边界中传播
- 作者：Tito Chowdhury;Mark Freeland;Ole Krogh;Geethakrishnan Narasimhan;Gayathri Raghavendra;SPIE-The International Society for Optical Engineering;SPIE v.5378
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control》 | 2004年
- poly gate etch;
- multivariable process control;
- part numbers;
- targets;
- control goals;
- gate width;
- microloading;
- model calibration;
- design of experiments (DOE);
3.Simulation Benchmarking for the Whole Resist Process

机译：整个抗蚀剂过程模拟基准测试
- 作者：Sang-Kon Kim;Ji-Eun Lee;Seung-Wook Park;Ji-Yong Yoo;Hye-Keun Oh;SPIE-The International Society for Optical Engineering;SPIE v.5378
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control》 | 2004年
- photolithography;
- simulation;
- benchmark;
- lithography;
- solid-C;
- process latitude;
4.Mix and match overlay method by compensating dynamic scan distortion error

机译：通过补偿动态扫描失真误差来混合和匹配叠加方法
- 作者：Takuya Kono;Manabu Takakuwa;Keita Asanuma;Nobuhiro Komine;Tatsuhiko Higashiki;SPIE-The International Society for Optical Engineering;SPIE v.5378
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control》 | 2004年
- mix and match;
- dynamic scan distortion;
- APC system;
5.Integrated electrical and SEM-based defect characterization for rapid yield ramp

机译：快速产量坡道的集成电气和SEM缺陷表征
- 作者：Jacob Orbon;Lior Levin;Ofer Bokobza;Rinat Shimshi;Manjari Dutta;Brian Zhang;Dennis Ciplickas;Teri Pham;Jim Jensen
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control》 | 2004年
6.Necessary Non-zero Lithography Overlay Correctables for Improved Device Performance for 110nm Generation and Lower Geometries

机译：必要的非零光刻覆盖材料，用于提高110nm生成和下几何形状的设备性能
- 作者：Igor Jekauc;Bill Roberts;Paul Young;Paul Jowett;Reuben Ferguson;Sean Louks;SPIE-The International Society for Optical Engineering;SPIE v.5378
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control》 | 2004年
- correctables;
- etch;
- CMP;
- deposition;
- non-zero overlay;
- alignment;
7.PVD fault detection using disparate integrated data sources

机译：使用不同集成数据源的PVD故障检测
- 作者：Alan F. Krauss;SPIE-The International Society for Optical Engineering;SPIE v.5378
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control》 | 2004年
- arc detection;
- fault detection;
- PVD;
- sputtering;
- process control;
- integrated sensor;
- in-situ;
8.Advanced module-based approach to effective CD prediction of sub-100 nm patterns

机译：基于先进的模块 - 基于模块的辅助CD预测子-100 nm模式
- 作者：Jangho Shin;Insung Kim;Chan Hwang;Dong-Woon Park;Sang-Gyun Woo;Han-Ku Cho;Woo-Sung Han;Joo-Tae Moon;SPIE-The International Society for Optical Engineering;SPIE v.5378
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control》 | 2004年
- lithography simulation;
- topography (TOPO);
- pupil intensity profile;
- gaussian convolution model;
- iso-dense bias (ID bias);
9.Necessary nonzero lithography overlay correctables for improved device performance for 110nm generation and lower geometries

机译：必要的非零光刻覆盖材料，用于提高110nm生成和下几何形状的设备性能
- 作者：Igor Jekauc;Bill Roberts;Paul Young;Paul Jowett;Reuben Ferguson;Sean Louks
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control》 | 2004年
- correctables;
- etch;
- CMP;
- deposition;
- non-zero overlay;
- alignment;
10.Intel Nanotechnology Integrated Process Control Systems: An Overview

机译：英特尔纳米技术集成过程控制系统：概述
- 作者：Kumud Srinivasan;Youssry Botros;SPIE-The International Society for Optical Engineering;SPIE v.5378
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control》 | 2004年
11.Integrated electrical and SEM based defect characterization for rapid yield ramp

机译：基于电气和SEM的快速产量斜坡的缺陷表征
- 作者：Jacob Orbon;Lior Levin;Ofer Bokobza;Rinat Shimshi;Manjari Dutta;Brian Zhang;Dennis Ciplickas;Teri Pham;Jim Jensen;SPIE-The International Society for Optical Engineering;SPIE v.5378
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control》 | 2004年
12.Development of customer assistance software for alignment parameter optimization

机译：开发对准参数优化的客户辅助软件
- 作者：Yuho Kanaya;Shinichi Nakajima;SPIE-The International Society for Optical Engineering;SPIE v.5378
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control》 | 2004年
- alignment;
- overlay;
- evaluation;
- optimization;
13.Automatic Defect Classification using Topography Map from SEM Photometric Stereo

机译：使用SEM光度立体声的地形图自动缺陷分类
- 作者：Sergio David Serulnik;Jacob Cohen;Boris Sherman;Ariel Ben-Porath;SPIE-The International Society for Optical Engineering;SPIE v.5378
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control》 | 2004年
- defect;
- topographic;
- classification;
- SEM;
- core class;
14.Advanced process control applied to metal layer overlay process

机译：应用于金属层覆盖过程的先进过程控制
- 作者：Christopher J. Gould;Yuanting Cui;Sean Louks;SPIE-The International Society for Optical Engineering;SPIE v.5378
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control》 | 2004年
- process;
- overlay;
- alignment mark;
- metal;
- CMP;
- APC;
- feed-forward;
- model based control;
15.Multivariable versus univariable APC

机译：多变量VS Univare APC
- 作者：Kamyar Faron;Mark Freeland;Ole Krogh;Sukesh Patel;Gayathri Raghavendra;SPIE-The International Society for Optical Engineering;SPIE v.5378
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control》 | 2004年
- poly gate etch;
- process control;
- multivariable;
- univariable;
- targets;
- control goals;
- gate width;
- microloading;
- uniformity;
- chamber matching;
16.Modeling for Profile-Based Process-Window Metrology

机译：基于个人资料的流程窗口计量模型
- 作者：Christopher P. Ausschnitt;Shaunee Y. Cheng;SPIE-The International Society for Optical Engineering;SPIE v.5378
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control》 | 2004年
- critical dimension;
- process control;
- lithography;
- scatterometry;
- process-window metrology;
17.Model-Based Fault Detection and Metrology Error Rejection in Registration APC System

机译：基于模型的故障检测和注册APC系统中的计量误差
- 作者：Ziqiang John Mao;Issi Geier;SPIE-The International Society for Optical Engineering;SPIE v.5378
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control》 | 2004年
18.Yield Loss in Lithographic Patterning at the 65nm Node and Beyond

机译：65nm节点及超出的光刻图案中的屈服损失
- 作者：Kevin M. Monahan;Brad Eichelberger;Matt Hankinson;John Robinson;Mike Slessor;SPIE-The International Society for Optical Engineering;SPIE v.5378
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control》 | 2004年
19.In-line lithography cluster monitoring and control using integrated scatterometry

机译：使用集成散射测定法在线光刻集群监控和控制
- 作者：Ivan Pollentier;Shaunee Y. Cheng;Bart Baudemprez;David Laidler;Youri van Dommelen;Rene Carpaij;Jackie Yu;Junichi Uchida;Anita Viswanathan;Doris Chin;Kelly Barry;Nickhil Jakatdar;SPIE-The International Society for Optical Engineering;SPIE v.5378
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control》 | 2004年
- CD control;
- integrated metrology;
- scatterometry;
- APC;
20.Enhancement of Photolithographic Performance by Implementing an Advanced Process Control System

机译：通过实施先进的过程控制系统来提高光刻性能
- 作者：David Crow;Etienne Joubert;Alan Carlson;Irit K. Abarmovich;Dorit Karlikar;Miri Kish;SPIE-The International Society for Optical Engineering;SPIE v.5378
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control》 | 2004年
- APC;
- overlay;
- filtering;
- tool PM adjust;
21.CD error budget analysis in ArF lithography

机译：ARF光刻中的CD错误预算分析
- 作者：Takahisa Otsuka;Kazuo Sakamoto;SPIE-The International Society for Optical Engineering;SPIE v.5378
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control》 | 2004年
- 193nm;
- CD control;
- flare;
- LWR;
22.Improvement of 90 nm KrF Cu Process Window by Minimizing Via Deformation Caused by Low Frequency Resonance of Scanner Projection Lens

机译：通过扫描仪投影透镜的低频谐振引起的通过变形来改进90nm KRF CU处理窗口
- 作者：Shu-Ping Fang;Benjamin Szu-Min Lin;Kuei-Chun Hung;SPIE-The International Society for Optical Engineering;SPIE v.5378
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control》 | 2004年
- KrF lithography;
- 90 nm;
- BEOL;
- lens aberration;
- resonance;
23.Improvement of 90nm KrF Cu process window by minimizing via deformation caused by low-frequency resonance of scanner projection lens

机译：通过扫描仪投影透镜的低频共振引起的通过变形最小化改进90nm KRF CU处理窗口
- 作者：Shu-Ping Fang;Benjamin S. Lin;Kuei-Chun Hung
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control》 | 2004年
- KrF lithography;
- 90 nm;
- BEOL;
- lens aberration;
- resonance;
24.Comparing the Transient Response of a Resistive-Type Sensor with a Thin-Film Thermocouple during the Post-Exposure Bake Process

机译：在曝光后烘烤过程中将电阻式传感器的瞬态响应与薄膜热电偶进行比较
- 作者：Kenneth G. Kreider;David P. DeWitt;Joel B. Fowler;James E. Proctor;William A. Kimes;Dean C. Ripple;Benjamin K. Tsai;SPIE-The International Society for Optical Engineering;SPIE v.5378
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control》 | 2004年
25.Intra-wafer CDU characterization to determine process and focus contributions based on Scatterometry Metrology

机译：晶圆内CDU表征，以确定基于散射计量的过程和焦点贡献
- 作者：Mircea Dusa;Richard Moerman;Bhanwar Singh;Paul Friedberg;Ray Hoobler;Terry Zavecz;SPIE-The International Society for Optical Engineering;SPIE v.5378
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control》 | 2004年
- diffractive OCD;
- CDU;
- SWA;
- spatial distribution;
- process disturbances;
- feature response;
- spatial covariance;
26.Resolution Enhancement Technology: The Past, the Present, and Extensions for the Future

机译：解决方案增强技术：过去，目前和未来的扩展
- 作者：Franklin M. Schellenberg;SPIE-The International Society for Optical Engineering;SPIE v.5378
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control》 | 2004年
- history of optics;
- abbe;
- resolution;
- resolution enhancement;
- RET;
- polarization;
27.In-tool process control for advanced patterning based on integrated metrology

机译：基于综合计量的先进图案化工具过程控制
- 作者：David S. L. Mui;Hiroki Sasano;Wei Liu;John Yamartino;Andy Skumanich;SPIE-The International Society for Optical Engineering;SPIE v.5378
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control》 | 2004年
- integrated metrology;
- advanced process control;
- advanced equipment control;
- closed loop control;
- and realtime;
28.Automated Fault Detection and Classification of Etch Systems Using Modular Neural Networks

机译：使用模块化神经网络自动化故障检测和蚀刻系统分类
- 作者：Sang Jeen Hong;Gary S. May;John Yamartino;Andrew Skumanich;SPIE-The International Society for Optical Engineering;SPIE v.5378
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control》 | 2004年
29.Use Case Approach to Integrating and Implementing Lithography Run-to-Run Control

机译：用来集成和实现光刻运行控制的案例方法
- 作者：Dorit Karlikar;Irit K. Abarmovich;Miri Kish;David Crow;Etienne Joubert;Alan Carlson;SPIE-The International Society for Optical Engineering;SPIE v.5378
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control》 | 2004年
- use case;
- integration;
- overlay;
- APC;
- process control;
30.Complementary Feed-Forward and Feedback Method for Improved Critical Dimension Control

机译：改进关键尺寸控制的互补前馈和反馈方法
- 作者：Igor Jekauc;Chris Gould;Walter Hartner;Tim Urenda;SPIE-The International Society for Optical Engineering;SPIE v.5378
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control》 | 2004年
- feedback;
- feed-forward;
- CD;
- dose;
- process control;
31.Improving Manufacturing Variability Control in Advanced CMOS Technology by Using TCAD Methodology

机译：通过使用TCAD方法改善高级CMOS技术的制造变化控制
- 作者：Jihong Chen;Jeff Wu;Kaiping Liu;Hong Yang;David Scott;SPIE-The International Society for Optical Engineering;SPIE v.5378
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Data Analysis and Modeling for Process Control》 | 2004年
- TCAD;
- DOE;
- device simulation;
- process simulation;
- process variation;
- statistical model;